Invention Grant
US08358466B2 Optical delay line interferometers with silicon dual mirror for DPSK
有权
光学延迟线干涉仪带硅双镜面用于DPSK
- Patent Title: Optical delay line interferometers with silicon dual mirror for DPSK
- Patent Title (中): 光学延迟线干涉仪带硅双镜面用于DPSK
-
Application No.: US12584886Application Date: 2009-09-14
-
Publication No.: US08358466B2Publication Date: 2013-01-22
- Inventor: Ming Cai , Ruibo Wang
- Applicant: Ming Cai , Ruibo Wang
- Applicant Address: US CA San Jose
- Assignee: Oclaro (North America), Inc.
- Current Assignee: Oclaro (North America), Inc.
- Current Assignee Address: US CA San Jose
- Agency: Fenwick & West LLP
- Main IPC: G02B5/30
- IPC: G02B5/30

Abstract:
Delay line interferometer designs using combinations of basic optical components that are expected to simplify manufacture and reduce costs while still providing precision optical performance. The main operative components of these designs are polarization beam splitters, birefringent crystals, optical delay components, and waveplates. Temperature controllers may be provided for adjusting the delay of the optical delay components.
Public/Granted literature
- US20110063728A1 Delay line interferometers Public/Granted day:2011-03-17
Information query