Invention Grant
- Patent Title: Method of drawing a pattern for magnetic transfer
- Patent Title (中): 绘制磁转移图案的方法
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Application No.: US12910181Application Date: 2010-10-22
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Publication No.: US08358570B2Publication Date: 2013-01-22
- Inventor: Hiroto Kikuchi
- Applicant: Hiroto Kikuchi
- Applicant Address: JP Kawasaki-shi
- Assignee: Fuji Electric Co., Ltd.
- Current Assignee: Fuji Electric Co., Ltd.
- Current Assignee Address: JP Kawasaki-shi
- Agency: Rabin & Berdo, P.C.
- Priority: JP2009-242964 20091022
- Main IPC: G11B9/10
- IPC: G11B9/10

Abstract:
A method of drawing a pattern for magnetic transfer on a substrate, including the steps of rotating the substrate and scanning the substrate, by an electron beam, in a circumferential direction thereof, deflecting, using a deflection signal, the electron beam in a radial direction thereof, and switching irradiation of the electron beam on and off, so as to create the pattern of a plurality of dots.
Public/Granted literature
- US20110096640A1 METHOD OF DRAWING A PATTERN FOR MAGNETIC TRANSFER Public/Granted day:2011-04-28
Information query
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