Invention Grant
- Patent Title: Interpolation of irregular data in a finite-dimensional metric space in lithographic simulation
- Patent Title (中): 在光刻模拟中的有限维度量空间中插入不规则数据
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Application No.: US11966920Application Date: 2007-12-28
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Publication No.: US08358828B2Publication Date: 2013-01-22
- Inventor: Srini Doddi , Junjiang Lei , Kuang-Hao Lay , Weiping Fang
- Applicant: Srini Doddi , Junjiang Lei , Kuang-Hao Lay , Weiping Fang
- Applicant Address: US CA San Jose
- Assignee: Cadence Design Systems, Inc.
- Current Assignee: Cadence Design Systems, Inc.
- Current Assignee Address: US CA San Jose
- Agency: Vista IP Law Group, LLP
- Main IPC: G06K9/00
- IPC: G06K9/00

Abstract:
A method, system, and computer program product for preprocessing a pattern in a library of patterns and querying a preprocessed library of patterns are disclosed. Embodiments for querying a preprocessed library of patterns are disclosed for determining a distance between the representation for the first pattern and the representation for the second pattern, determining whether the distance between the representation for the first pattern and the representation for the second pattern is within the range for the first pattern, and transforming the second pattern with the transformation matrix to provide information about the second pattern. Embodiments for preprocessing a pattern in a library of patterns are disclosed for determining a transformation matrix for the first pattern, determining a range for the first pattern, wherein a distance between a representation for a first pattern and a representation for a second pattern is within the range and the second pattern can be transformed with the transformation matrix to provide information about the second pattern, and associating the range and the transformation matrix with the first pattern.
Public/Granted literature
- US20090169114A1 INTERPOLATION OF IRREGULAR DATA IN A FINITE-DIMENSIONAL METRIC SPACE IN LITHOGRAPHIC SIMULATION Public/Granted day:2009-07-02
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