Invention Grant
- Patent Title: Fluidic device unit structure
- Patent Title (中): 流体装置单元结构
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Application No.: US12227967Application Date: 2007-04-19
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Publication No.: US08365768B2Publication Date: 2013-02-05
- Inventor: Hiroki Igarashi
- Applicant: Hiroki Igarashi
- Applicant Address: JP Saitama
- Assignee: Surpass Industry Co., Ltd.
- Current Assignee: Surpass Industry Co., Ltd.
- Current Assignee Address: JP Saitama
- Agency: Lucas & Mercanti, LLP
- Agent Robert P. Michal
- Priority: JP2006-158407 20060607
- International Application: PCT/JP2007/058492 WO 20070419
- International Announcement: WO2007/141962 WO 20071213
- Main IPC: F16K11/22
- IPC: F16K11/22

Abstract:
A fluidic device unit structure in which a plurality of fluidic devices are integrated and which is effective in reducing a footprint is provided. With a fluidic device unit structure in which a plurality of fluidic devices that are connected by channels are integrated in a base member 10 in parallel, the base member 10, which has a plurality of mounting surfaces 11 on which pure-water opening and closing valves 5 are mounted, includes a pure-water circulation supply line 2 that passes through the base member 10 and that is connected in parallel to the pure-water opening and closing valves 5 via pure-water branch channels 4.
Public/Granted literature
- US20090308474A1 FLUIDIC DEVICE UNIT STRUCTURE Public/Granted day:2009-12-17
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