Invention Grant
- Patent Title: Photocurable composition
- Patent Title (中): 可光固化组合物
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Application No.: US12748349Application Date: 2010-03-26
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Publication No.: US08366818B2Publication Date: 2013-02-05
- Inventor: Tsutomu Umebayashi
- Applicant: Tsutomu Umebayashi
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JP2009-078189 20090327
- Main IPC: C09D11/00
- IPC: C09D11/00

Abstract:
A photocurable composition is provided that includes a compound represented by Formula (I) below, in Formula (I), X denotes O, S, or NRa, n1 denotes 0 or 1, and R1 to R14 and Ra independently denote a hydrogen atom, a halogen atom, or a monovalent substituent, at least one of R1 to R14 and Ra not being a hydrogen atom). There is also provided an inkjet recording method that includes (a1) a step of discharging the photocurable composition onto a recording medium and (b1) a step of curing the photocurable composition by irradiating the discharged photocurable composition with light.
Public/Granted literature
- US20100247797A1 PHOTOCURABLE COMPOSITION Public/Granted day:2010-09-30
Information query
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