Invention Grant
- Patent Title: Susceptor apparatus for inverted type MOCVD reactor
- Patent Title (中): 反型MOCVD反应器的受体装置
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Application No.: US10382198Application Date: 2003-03-04
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Publication No.: US08366830B2Publication Date: 2013-02-05
- Inventor: Shuji Nakamura , Steven DenBaars , Max Batres , Michael Coulter
- Applicant: Shuji Nakamura , Steven DenBaars , Max Batres , Michael Coulter
- Applicant Address: US CA Goleta
- Assignee: Cree, Inc.
- Current Assignee: Cree, Inc.
- Current Assignee Address: US CA Goleta
- Agency: Koppel, Patrick, Heybl & Philpott
- Main IPC: H01L21/00
- IPC: H01L21/00 ; C23C14/00 ; C23C16/00

Abstract:
The present invention discloses a susceptor mounting assembly for holding semiconductor wafers in an MOCVD reactor during growth of epitaxial layers on the wafers, that is particularly adapted for mounting a susceptor in an inverted type reactor chamber. It includes a tower having an upper and lower end with the upper end mounted to the top inside surface of the reactor chamber and a susceptor is arranged at the tower's lower end. Semiconductor wafers are held adjacent to the susceptor such that heat from the susceptor passes into wafers. A second embodiment of a susceptor mounting assembly according to the invention also comprises a tower having an upper and lower end. The tower's upper end is mounted to the top inside surface of the reactor chamber. A susceptor is housed within a cup and the cup is mounted to the tower's lower end.
Public/Granted literature
- US20040175939A1 Susceptor apparatus for inverted type MOCVD reactor Public/Granted day:2004-09-09
Information query
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