Invention Grant
- Patent Title: Method for forming structure and method for manufacturing liquid ejecting head
- Patent Title (中): 用于形成液体喷射头的结构和方法的方法
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Application No.: US13140374Application Date: 2009-12-16
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Publication No.: US08366862B2Publication Date: 2013-02-05
- Inventor: Hirono Yoneyama
- Applicant: Hirono Yoneyama
- Applicant Address: JP Tokyo
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP Tokyo
- Agency: Canon USA Inc IP Division
- Priority: JP2008-323789 20081219
- International Application: PCT/JP2009/006911 WO 20091216
- International Announcement: WO2010/070893 WO 20100624
- Main IPC: B29C59/16
- IPC: B29C59/16

Abstract:
A method for forming a structure includes: a step of forming on a substrate a resin layer composed of a resin which is cured by irradiation with active energy rays; a step of pressing a first mold on the resin layer, the first mold being composed of an active energy ray-transmitting material and having projections each having an active energy ray-shielding film at the end thereof; a first irradiation step of irradiating the resin layer; a step of pressing a second mold on the resin layer within a region where the resin layer is not exposed to the rays, the second mold being composed of an active energy ray-transmitting material and having projections each having an active energy ray-shielding film at the end thereof; and a second irradiation step of irradiating a portion of the unexposed region of the resin layer.
Public/Granted literature
- US20110308720A1 METHOD FOR FORMING STRUCTURE AND METHOD FOR MANUFACTURING LIQUID EJECTING HEAD Public/Granted day:2011-12-22
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