Invention Grant
US08366862B2 Method for forming structure and method for manufacturing liquid ejecting head 失效
用于形成液体喷射头的结构和方法的方法

  • Patent Title: Method for forming structure and method for manufacturing liquid ejecting head
  • Patent Title (中): 用于形成液体喷射头的结构和方法的方法
  • Application No.: US13140374
    Application Date: 2009-12-16
  • Publication No.: US08366862B2
    Publication Date: 2013-02-05
  • Inventor: Hirono Yoneyama
  • Applicant: Hirono Yoneyama
  • Applicant Address: JP Tokyo
  • Assignee: Canon Kabushiki Kaisha
  • Current Assignee: Canon Kabushiki Kaisha
  • Current Assignee Address: JP Tokyo
  • Agency: Canon USA Inc IP Division
  • Priority: JP2008-323789 20081219
  • International Application: PCT/JP2009/006911 WO 20091216
  • International Announcement: WO2010/070893 WO 20100624
  • Main IPC: B29C59/16
  • IPC: B29C59/16
Method for forming structure and method for manufacturing liquid ejecting head
Abstract:
A method for forming a structure includes: a step of forming on a substrate a resin layer composed of a resin which is cured by irradiation with active energy rays; a step of pressing a first mold on the resin layer, the first mold being composed of an active energy ray-transmitting material and having projections each having an active energy ray-shielding film at the end thereof; a first irradiation step of irradiating the resin layer; a step of pressing a second mold on the resin layer within a region where the resin layer is not exposed to the rays, the second mold being composed of an active energy ray-transmitting material and having projections each having an active energy ray-shielding film at the end thereof; and a second irradiation step of irradiating a portion of the unexposed region of the resin layer.
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