Invention Grant
US08367005B2 Gas processing apparatus, gas processing system, and gas processing method, and exhaust gas processing system and internal combustion engine using the same 有权
气体处理装置,气体处理系统和气体处理方法以及使用其的废气处理系统和内燃机

Gas processing apparatus, gas processing system, and gas processing method, and exhaust gas processing system and internal combustion engine using the same
Abstract:
A gas processing apparatus for processing a gas using plasma is highly versatile and capable of rapidly processing a large quantity of gas that includes particularly an aromatic compound or other component that is difficult to process. The gas processing apparatus comprises a plasma equipment series comprising a plurality of gas processing units arranged in series on a gas flow channel; and a control section for controlling the operation of each unit of plasma equipment of the plasma equipment series. Each of the units of plasma equipment comprises a cavity composed of an electrical conductor and communicated with the gas flow channel; a plasma generator for generating plasma within the cavity; and microwave radiator for radiating microwaves to the plasma generated by the plasma starting section. The control section selects the number of units of plasma equipment to operate according to a component of the introduced gas.
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