Invention Grant
- Patent Title: Gas processing apparatus, gas processing system, and gas processing method, and exhaust gas processing system and internal combustion engine using the same
- Patent Title (中): 气体处理装置,气体处理系统和气体处理方法以及使用其的废气处理系统和内燃机
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Application No.: US12668852Application Date: 2008-07-12
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Publication No.: US08367005B2Publication Date: 2013-02-05
- Inventor: Yuji Ikeda , Shinobu Makita
- Applicant: Yuji Ikeda , Shinobu Makita
- Applicant Address: JP Kobe-shi, Hyogo
- Assignee: Imagineering, Inc.
- Current Assignee: Imagineering, Inc.
- Current Assignee Address: JP Kobe-shi, Hyogo
- Agency: Westerman, Hattori, Daniels & Adrian, LLP
- Priority: JP2007-183754 20070712
- International Application: PCT/JP2008/062637 WO 20080712
- International Announcement: WO2009/008519 WO 20090115
- Main IPC: H05H1/00
- IPC: H05H1/00 ; H05H1/24 ; B01J19/12 ; G05B15/00 ; G05B1/00

Abstract:
A gas processing apparatus for processing a gas using plasma is highly versatile and capable of rapidly processing a large quantity of gas that includes particularly an aromatic compound or other component that is difficult to process. The gas processing apparatus comprises a plasma equipment series comprising a plurality of gas processing units arranged in series on a gas flow channel; and a control section for controlling the operation of each unit of plasma equipment of the plasma equipment series. Each of the units of plasma equipment comprises a cavity composed of an electrical conductor and communicated with the gas flow channel; a plasma generator for generating plasma within the cavity; and microwave radiator for radiating microwaves to the plasma generated by the plasma starting section. The control section selects the number of units of plasma equipment to operate according to a component of the introduced gas.
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