Invention Grant
- Patent Title: Method for producing trichlorosilane
- Patent Title (中): 制备三氯硅烷的方法
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Application No.: US12591429Application Date: 2009-11-19
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Publication No.: US08367029B2Publication Date: 2013-02-05
- Inventor: Chikara Inaba
- Applicant: Chikara Inaba
- Applicant Address: JP Tokyo
- Assignee: Mitsubishi Materials Corporation
- Current Assignee: Mitsubishi Materials Corporation
- Current Assignee Address: JP Tokyo
- Agency: Edwards Wildman Palmer LLP
- Priority: JP2007-275625 20071023; JP2008-187500 20080718
- Main IPC: C01B33/08
- IPC: C01B33/08

Abstract:
In the apparatus for producing trichlorosilane in which metal silicon powder supplied into the reactor is reacted with hydrogen chloride gas while being fluidized by the gas, thereby taking out trichlorosilane generated by the reaction from the upper part of the reactor, and a plurality of gas flow controlling members are installed at the internal space of the reactor along the vertical direction.
Public/Granted literature
- US20100074823A1 Apparatus for producing trichlorosilane and method for producing trichlorosilane Public/Granted day:2010-03-25
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