Invention Grant
US08367190B2 At low temperature, fast hardening composition for preparing protecting film, protecting film prepared therefrom, and substrate comprising the same
有权
在低温下，用于制备保护膜的快速硬化组合物，由其制备的保护膜和包含该膜的基材
- Patent Title: At low temperature, fast hardening composition for preparing protecting film, protecting film prepared therefrom, and substrate comprising the same
- Patent Title (中): 在低温下，用于制备保护膜的快速硬化组合物，由其制备的保护膜和包含该膜的基材
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Application No.: US12311023Application Date: 2007-09-18
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Publication No.: US08367190B2Publication Date: 2013-02-05
- Inventor: Jeong-Man Son , Minjin Ko , Myungsun Moon , Byung-Ro Kim , Jaeho Cheong
- Applicant: Jeong-Man Son , Minjin Ko , Myungsun Moon , Byung-Ro Kim , Jaeho Cheong
- Applicant Address: KR Seoul
- Assignee: LG Chem, Ltd.
- Current Assignee: LG Chem, Ltd.
- Current Assignee Address: KR Seoul
- Agency: McKenna Long & Aldridge LLP
- Priority: KR10-2006-0090311 20060918
- International Application: PCT/KR2007/004491 WO 20070918
- International Announcement: WO2008/035890 WO 20080327
- Main IPC: B32B7/02
- IPC: B32B7/02
Abstract:
The present invention relates to a composition for preparing an excellent protecting film with high strength, wear resistance, and excellent barrier property by low temperature hardening, a protecting film prepared therefrom, a substrate comprising the same, and a component or device comprising the same. The composition comprises an organosiloxane polymer a), a photobase generator b), and an organic solvent c).
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