Invention Grant
- Patent Title: Halftone mask and manufacturing method thereof and method for forming film using the same
- Patent Title (中): 半色调掩模及其制造方法和使用其形成膜的方法
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Application No.: US12824086Application Date: 2010-06-25
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Publication No.: US08367278B2Publication Date: 2013-02-05
- Inventor: Oh-Seob Kwon , Jae-Yong Kim , Sung-Chul Kim , Kyoung-Bo Kim , Il-Jeong Lee , Cheol-Ho Yu , Yong-Woo Park , Han-Hee Yoon , In-Young Jung
- Applicant: Oh-Seob Kwon , Jae-Yong Kim , Sung-Chul Kim , Kyoung-Bo Kim , Il-Jeong Lee , Cheol-Ho Yu , Yong-Woo Park , Han-Hee Yoon , In-Young Jung
- Applicant Address: KR Yongin, Gyeonggi-Do
- Assignee: Samsung Display Co., Ltd.
- Current Assignee: Samsung Display Co., Ltd.
- Current Assignee Address: KR Yongin, Gyeonggi-Do
- Agent Robert E. Bushnell, Esq.
- Priority: KR10-2009-0056941 20090625
- Main IPC: G03F1/32
- IPC: G03F1/32

Abstract:
Embodiments relate to halftone masks that can uniformly form the height of an underlying layer in two regions that are spaced apart from each other, a manufacturing method thereof, and a method for forming a film using the same. The halftone mask includes a first light blocking unit and a second light blocking unit, and a semi-transmitting unit that is disposed adjacent to the side of the second light blocking unit. The first and second light blocking units block light and are spaced apart from each other at a predetermined interval. The semi-transmitting unit is positioned at a side far from the first light blocking unit and reduces intensity of light. Sum of the second length of the second light blocking unit and the third length of the semi-transmitting unit is larger than the first length of the first blocking unit.
Public/Granted literature
- US20100330468A1 HALFTONE MASK AND MANUFACTURING METHOD THEREOF AND METHOD FOR FORMING FILM USING THE SAME Public/Granted day:2010-12-30
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