Invention Grant
- Patent Title: Color filter and photomask to be employed for the manufacture of color filter
- Patent Title (中): 彩色滤光片和光掩模用于制造滤色片
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Application No.: US12222665Application Date: 2008-08-13
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Publication No.: US08367280B2Publication Date: 2013-02-05
- Inventor: Atsuko Kamada , Ryuji Kawamoto , Junichi Shiraishi
- Applicant: Atsuko Kamada , Ryuji Kawamoto , Junichi Shiraishi
- Applicant Address: JP Tokyo
- Assignee: Toppan Printing Co., Ltd.
- Current Assignee: Toppan Printing Co., Ltd.
- Current Assignee Address: JP Tokyo
- Priority: JP2006-065700 20060310
- Main IPC: G02B5/20
- IPC: G02B5/20

Abstract:
A color filter including a first photo-spacer, and a second photo-spacer having a smaller film thickness than that of the first photo-spacer, wherein the second photo-spacer has a cross-sectional configuration whose longitudinal width is made greater than the lateral width. These photo-spacers are formed by making use of a photomask which includes a first aperture pattern for forming the first photo-spacer, a second aperture pattern for forming the second photo-spacer which has a smaller film thickness than that of the first photo-spacer, wherein an aperture of the second aperture pattern has a lateral width in the range 2.0-10.0 μm and the ratio of lateral width to longitudinal width is confined to 11.25 or more.
Public/Granted literature
- US20090015957A1 Color filter and photomask to be employed for the manufacture of color filter Public/Granted day:2009-01-15
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