Invention Grant
US08367280B2 Color filter and photomask to be employed for the manufacture of color filter 有权
彩色滤光片和光掩模用于制造滤色片

Color filter and photomask to be employed for the manufacture of color filter
Abstract:
A color filter including a first photo-spacer, and a second photo-spacer having a smaller film thickness than that of the first photo-spacer, wherein the second photo-spacer has a cross-sectional configuration whose longitudinal width is made greater than the lateral width. These photo-spacers are formed by making use of a photomask which includes a first aperture pattern for forming the first photo-spacer, a second aperture pattern for forming the second photo-spacer which has a smaller film thickness than that of the first photo-spacer, wherein an aperture of the second aperture pattern has a lateral width in the range 2.0-10.0 μm and the ratio of lateral width to longitudinal width is confined to 11.25 or more.
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