Invention Grant
- Patent Title: Method of exposing substrate, apparatus for performing the same, and method of manufacturing display substrate using the same
- Patent Title (中): 曝光基板的方法，其制造方法以及使用其制造显示基板的方法
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Application No.: US12778574Application Date: 2010-05-12
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Publication No.: US08367281B2Publication Date: 2013-02-05
- Inventor: Bo-Kyoung Ahn , Gug-Rae Jo , Hong-Suk Yoo , Chang-Hoon Kim , Min-Uk Kim , Joo-Han Bae
- Applicant: Bo-Kyoung Ahn , Gug-Rae Jo , Hong-Suk Yoo , Chang-Hoon Kim , Min-Uk Kim , Joo-Han Bae
- Applicant Address: KR Yongin, Gyeonggi-Do
- Assignee: Samsung Display Co., Ltd.
- Current Assignee: Samsung Display Co., Ltd.
- Current Assignee Address: KR Yongin, Gyeonggi-Do
- Agency: F. Chau & Associates, LLC
- Priority: KR2009-0119736 20091204
- Main IPC: G03F7/20
- IPC: G03F7/20 ; G02B5/20
Abstract:
A photoresist layer exposed through first slits of a mask is exposed using first light. The photoresist layer exposed through second slits of the mask is exposed by using second light. The first light passes thorough a transflective shutter to generate the second light.
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