Invention Grant
US08367297B2 Resist composition, method of forming resist pattern, novel compound and acid generator
有权
抗蚀剂组合物，抗蚀剂图案形成方法，新型化合物和酸发生剂
- Patent Title: Resist composition, method of forming resist pattern, novel compound and acid generator
- Patent Title (中): 抗蚀剂组合物，抗蚀剂图案形成方法，新型化合物和酸发生剂
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Application No.: US12654066Application Date: 2009-12-09
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Publication No.: US08367297B2Publication Date: 2013-02-05
- Inventor: Akiya Kawaue , Yoshiyuki Utsumi , Shinichi Hidesaka , Natsuko Maruyama
- Applicant: Akiya Kawaue , Yoshiyuki Utsumi , Shinichi Hidesaka , Natsuko Maruyama
- Applicant Address: JP Kanagawa-ken
- Assignee: Tokyo Ohka Kogyo Co., Ltd.
- Current Assignee: Tokyo Ohka Kogyo Co., Ltd.
- Current Assignee Address: JP Kanagawa-ken
- Agency: Wenderoth, Lind & Ponack, L.L.P.
- Priority: JPP2008-314979 20081210
- Main IPC: G03F7/004
- IPC: G03F7/004 ; G03F7/30 ; C07D333/00 ; C07C69/66 ; C07C309/06 ; C07C309/19
Abstract:
A resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the acid-generator component (B) including an acid generator (B1) containing a compound having a cation moiety represented by general formula (I) (in the formula, R5 represents a hydrogen atom or an organic group of 1 to 30 carbon atoms which may have a substituent; and Q5 represents a single bond or a divalent linking group).
Public/Granted literature
- US20100196820A1 Resist composition, method of forming resist pattern, novel compound and acid generator Public/Granted day:2010-08-05
Information query
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