Invention Grant
- Patent Title: Salt and photoresist composition containing the same
- Patent Title (中): 含有其的盐和光致抗蚀剂组合物
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Application No.: US12835427Application Date: 2010-07-13
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Publication No.: US08367298B2Publication Date: 2013-02-05
- Inventor: Koji Ichikawa , Masako Sugihara , Hiromu Sakamoto
- Applicant: Koji Ichikawa , Masako Sugihara , Hiromu Sakamoto
- Applicant Address: JP Tokyo
- Assignee: Sumitomo Chemical Company, Limited
- Current Assignee: Sumitomo Chemical Company, Limited
- Current Assignee Address: JP Tokyo
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: JP2009-167674 20090716
- Main IPC: G03F7/00
- IPC: G03F7/00 ; G03F7/004 ; G03F7/028 ; G03F7/40
Abstract:
A salt having a divalent group represented by the formula (aa): wherein Xa and Xb independently each represent —O— or —S—, Ra, Rb, Rc and Rd independently each represent a hydrogen atom, a C1-C4 alkyl group or a C1-C4 alkoxy group, and m represents 1 or 2.
Public/Granted literature
- US20110014568A1 SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME Public/Granted day:2011-01-20
Information query
