Invention Grant
- Patent Title: Solution to optical constraint on microtruss processing
-
Application No.: US12700800Application Date: 2010-02-05
-
Publication No.: US08367307B2Publication Date: 2013-02-05
- Inventor: Jeffrey A. Rock
- Applicant: Jeffrey A. Rock
- Applicant Address: US MI Detroit
- Assignee: GM Global Technology Operations LLC
- Current Assignee: GM Global Technology Operations LLC
- Current Assignee Address: US MI Detroit
- Agency: Fraser Clemens Martin & Miller LLC
- Agent J. Douglas Miller
- Main IPC: G03F7/20
- IPC: G03F7/20

Abstract:
A system for fabricating a radiation-cured structure is provided. The system includes a radiation-sensitive material having a first refractive index; a mask formed from a mask material having a second refractive index; and a radiation source. The mask is disposed between the radiation source and the radiation-sensitive material, and has a plurality of substantially radiation transparent apertures. The radiation source is configured to generate radiation beams for at least one of initiating, polymerizing, and crosslinking the radiation-sensitive material. The system includes at least one of a) an at least one normalizing surface disposed between the radiation source and the mask, b) a refractive fluid having a third refractive index disposed between the radiation source and the mask, and c) the refractive fluid having the third refractive index disposed between the mask and the radiation-sensitive material. A method for fabricating the radiation-cured structure is also provided.
Public/Granted literature
- US20110195361A1 SOLUTION TO OPTICAL CONSTRAINT ON MICROTRUSS PROCESSING Public/Granted day:2011-08-11
Information query
IPC分类: