Invention Grant
- Patent Title: Method for producing hollow structure
- Patent Title (中): 中空结构的制造方法
-
Application No.: US12909329Application Date: 2010-10-21
-
Publication No.: US08367311B2Publication Date: 2013-02-05
- Inventor: Wataru Kusaki , Toshinobu Ishihara
- Applicant: Wataru Kusaki , Toshinobu Ishihara
- Applicant Address: JP Tokyo
- Assignee: Shin-Etsu Chemical Co., Ltd.
- Current Assignee: Shin-Etsu Chemical Co., Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Oliff & Berridge, PLC
- Priority: JP2009-265958 20091124
- Main IPC: G03F7/26
- IPC: G03F7/26

Abstract:
Provided is a fabrication method with which a laminate having a hollow structure can be produced more easily, while enabling to produce a multilayer structure as well. That is, a method for producing a hollow structure, a fabrication method by stacking-up a structural material among fabrication methods of a hollow structure on a substrate, the method including; a step of forming a structural material layer on a substrate, a step of forming a pattern on the structural material layer, a step of forming a sacrificial material layer by burying between the patterns with a water-soluble or an alkaline-soluble polymer as the sacrificial material to be buried between the patterns, a step of further laminating a structural material layer and forming a pattern on the structural material layer laminated, and a step of finally removing the sacrificial material after all of lamination is completed.
Public/Granted literature
- US20110123935A1 METHOD FOR PRODUCING HOLLOW STRUCTURE Public/Granted day:2011-05-26
Information query
IPC分类: