Invention Grant
- Patent Title: Method of manufacturing semiconductor light emitting element
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Application No.: US12998521Application Date: 2009-10-27
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Publication No.: US08367442B2Publication Date: 2013-02-05
- Inventor: Kazuyuki Yamae , Hiroshi Fukshima , Masaharu Yasuda , Tomoya Iwahashi , Hidenori Kamei , Syuusaku Maeda
- Applicant: Kazuyuki Yamae , Hiroshi Fukshima , Masaharu Yasuda , Tomoya Iwahashi , Hidenori Kamei , Syuusaku Maeda
- Applicant Address: JP Kadoma-shi
- Assignee: Panasonic Corporation
- Current Assignee: Panasonic Corporation
- Current Assignee Address: JP Kadoma-shi
- Agency: Edwards Wildman Palmer LLP
- Priority: JP2008-277315 20081028
- International Application: PCT/JP2009/068366 WO 20091027
- International Announcement: WO2010/050451 WO 20100506
- Main IPC: H01L21/786
- IPC: H01L21/786

Abstract:
A method of manufacturing the semiconductor light emitting element comprises a semiconductor layer forming step of forming the multilayered nitride semiconductor layer on the first wafer having a transparent property; a bonding step of bonding the multilayered nitride semiconductor layer to the first wafer; a groove forming step of forming the groove extending from the lower surface of the first wafer to the multilayered nitride semiconductor layer; a light applying step of applying a first light to the lower surface of the multilayered nitride semiconductor layer through the first wafer to reduce a bonding force between the multilayered nitride semiconductor layer and the first wafer; a separating step of separating the first wafer from the multilayered nitride semiconductor layer; and a cutting step of cutting the second wafer along the groove to divide into a plurality of the semiconductor light emitting element.
Public/Granted literature
- US08399272B2 Method of manufacturing semiconductor light emitting element Public/Granted day:2013-03-19
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