Invention Grant
US08367462B2 Large-scale fabrication of vertically aligned ZnO nanowire arrays
有权
垂直排列的ZnO纳米线阵列的大规模制造
- Patent Title: Large-scale fabrication of vertically aligned ZnO nanowire arrays
- Patent Title (中): 垂直排列的ZnO纳米线阵列的大规模制造
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Application No.: US13091855Application Date: 2011-04-21
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Publication No.: US08367462B2Publication Date: 2013-02-05
- Inventor: Zhong L. Wang , Suman Das , Sheng Xu , Dajun Yuan , Rui Guo , Yaguang Wei , Wenzhuo Wu
- Applicant: Zhong L. Wang , Suman Das , Sheng Xu , Dajun Yuan , Rui Guo , Yaguang Wei , Wenzhuo Wu
- Applicant Address: US GA Atlanta
- Assignee: Georgia Tech Research Corporation
- Current Assignee: Georgia Tech Research Corporation
- Current Assignee Address: US GA Atlanta
- Agency: Bockhop & Associates, LLC
- Agent Bryan W. Bockhop
- Main IPC: H01L33/26
- IPC: H01L33/26 ; H01L33/04 ; H01L21/36 ; B82Y40/00

Abstract:
In a method for growing a nanowire array, a photoresist layer is placed onto a nanowire growth layer configured for growing nanowires therefrom. The photoresist layer is exposed to a coherent light interference pattern that includes periodically alternately spaced dark bands and light bands along a first orientation. The photoresist layer exposed to the coherent light interference pattern along a second orientation, transverse to the first orientation. The photoresist layer developed so as to remove photoresist from areas corresponding to areas of intersection of the dark bands of the interference pattern along the first orientation and the dark bands of the interference pattern along the second orientation, thereby leaving an ordered array of holes passing through the photoresist layer. The photoresist layer and the nanowire growth layer are placed into a nanowire growth environment, thereby growing nanowires from the nanowire growth layer through the array of holes.
Public/Granted literature
- US20110309354A1 Large-scale Fabrication of Vertically Aligned ZnO Nanowire Arrays Public/Granted day:2011-12-22
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