Invention Grant
US08367543B2 Structure and method to improve current-carrying capabilities of C4 joints 有权
提高C4接头承载能力的结构和方法

Structure and method to improve current-carrying capabilities of C4 joints
Abstract:
A system and method comprises depositing a dielectric layer on a substrate and depositing a metal layer on the dielectric layer. The system and method further includes depositing a high temperature diffusion barrier metal cap on the metal layer. The system and method further includes depositing a second dielectric layer on the high temperature diffusion barrier metal cap and the first dielectric layer, and etching a via into the second dielectric layer, such that the high temperature diffusion barrier metal cap is exposed. The system and method further includes depositing an under bump metallurgy in the via, and forming a C4 ball on the under bump metallurgy layer.
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