Semiconductor device

Invention Grant

US08368151B2 Semiconductor device 失效

Title translation: 半导体器件

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Patent Title: Semiconductor device
Patent Title (中): 半导体器件
Application No.: US12644461

Application Date: 2009-12-22
Publication No.: US08368151B2

Publication Date: 2013-02-05
Inventor: Kenji Miyakoshi , Shinichiro Wada , Junji Noguchi , Koichiro Miyamoto , Masaya Iida , Masafumi Suefuji
Applicant: Kenji Miyakoshi , Shinichiro Wada , Junji Noguchi , Koichiro Miyamoto , Masaya Iida , Masafumi Suefuji
Applicant Address: JP Tokyo
Assignee: Hitachi, Ltd.
Current Assignee: Hitachi, Ltd.
Current Assignee Address: JP Tokyo
Agency: Mattingly & Malur, PC
Priority: JP2008-331862 20081226
Main IPC: H01L21/8234
IPC: H01L21/8234 ; H01L27/088

Abstract:

When MOS transistors having a plurality of threshold voltages in which a source and a drain form a symmetrical structure are mounted on the same substrate, electrically-symmetrical characteristics is provided with respect to an exchange of the source and the drain in each MOS transistor. A MOS transistor having a large threshold voltage is provided with a halo diffusion region, and halo implantation is not performed on a MOS transistor having a small threshold voltage.

Abstract(Chinese):

当源极和漏极形成对称结构的多个阈值电压的MOS晶体管被安装在同一衬底上时，相对于每个MOS晶体管中的源极和漏极的交换来提供电对称特性。具有大阈值电压的MOS晶体管具有卤素扩散区域，并且不对具有小阈值电压的MOS晶体管进行晕圈注入。

Public/Granted literature

US20100164015A1 SEMICONDUCTOR DEVICE Public/Granted day:2010-07-01

Information query

Espacenet

IPC分类:

H	电学
H01	基本电气元件
H01L	半导体器件；其他类目中不包括的电固体器件（使用半导体器件的测量入G01；一般电阻器入H01C；磁体、电感器、变压器入H01F；一般电容器入H01G；电解型器件入H01G9/00；电池组、蓄电池入H01M；波导管、谐振器或波导型线路入H01P；线路连接器、汇流器入H01R；受激发射器件入H01S；机电谐振器入H03H；扬声器、送话器、留声机拾音器或类似的声机电传感器入H04R；一般电光源入H05B；印刷电路、混合电路、电设备的外壳或结构零部件、电气元件的组件的制造入H05K；在具有特殊应用的电路中使用的半导体器件见应用相关的小类）
H01L21/00	专门适用于制造或处理半导体或固体器件或其部件的方法或设备
H01L21/70	.由在一共用基片内或其上形成的多个固态组件或集成电路组成的器件或其部件的制造或处理；集成电路器件或其特殊部件的制造（由预制电组件组成的组装件的制造入H05K3/00，H05K13/00）
H01L21/77	..在公共衬底中或上面形成的由许多固态元件或集成电路组成的器件的制造或处理（电可编程只读存储器或其多步骤的制造方法入H01L27/115）
H01L21/78	...把衬底连续地分成多个独立的器件（改变表面物理特性或者半导体形状的切割入H01L21/304）
H01L21/82	....制造器件，例如每一个由许多元件组成的集成电路
H01L21/822	.....衬底是采用硅工艺的半导体的（H01L21/8258优先）
H01L21/8232	......场效应工艺
H01L21/8234	.......MIS工艺