Invention Grant
- Patent Title: Junction barrier Schottky diode
- Patent Title (中): 结屏障肖特基二极管
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Application No.: US12868346Application Date: 2010-08-25
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Publication No.: US08368166B2Publication Date: 2013-02-05
- Inventor: Dev Alok Girdhar , Michael David Church
- Applicant: Dev Alok Girdhar , Michael David Church
- Applicant Address: US CA Milpitas
- Assignee: Intersil Americas Inc.
- Current Assignee: Intersil Americas Inc.
- Current Assignee Address: US CA Milpitas
- Agency: Barnes & Thornburg LLP
- Main IPC: H01L27/095
- IPC: H01L27/095 ; H01L29/47 ; H01L31/07

Abstract:
A junction barrier Schottky diode has N-type well having a surface and first peak impurity concentration; P-type anode region in surface of the well having second peak impurity concentration; N-type cathode contact region in surface of the well and laterally spaced from a first wall of the anode region having third peak impurity concentration; and first N-type region in surface of the well and laterally spaced from second wall of the anode region having fourth impurity concentration. Center of the spaced region between the first N-type region and the second wall of the anode region has fifth peak impurity concentration. Ohmic contact is made to the anode region and cathode contact region. Schottky contact is made to the first N-type region. First and fifth peak impurity concentrations are less than the fourth peak impurity concentration. The fourth peak impurity concentration is less than the second and third peak impurity concentrations.
Public/Granted literature
- US20100314708A1 JUNCTION BARRIER SCHOTTKY DIODE Public/Granted day:2010-12-16
Information query
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