An exposure apparatus that can prevent disadvantages due to a leaked liquid is provided. The exposure apparatus includes: a substrate holder (PH) that includes a peripheral wall portion (33) and supporting portions (34) located on an inside of the peripheral wall portion (33) and that supports a substrate (P) with the supporting portions (34) by negatively pressurizing a space (31) surrounded by the peripheral wall portion (33); and a recovery mechanism that includes a collection inlets (61) provided on the inside of the peripheral wall portion (33) and a vacuum system (63) connected to the collection inlets (61), in which a liquid penetrated from an outer periphery of the substrate (P) is sucked and recovered, in the state with an upper surface (33A) of the peripheral wall portion (33) and a back surface (Pb) of the substrate (P) being spaced at a first distance.