Invention Grant
- Patent Title: Polarizing element, method of manufacturing polarizing element, and electronic apparatus
- Patent Title (中): 极化元件,偏光元件的制造方法以及电子设备
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Application No.: US12967431Application Date: 2010-12-14
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Publication No.: US08369013B2Publication Date: 2013-02-05
- Inventor: Daisuke Sawaki
- Applicant: Daisuke Sawaki
- Applicant Address: JP Tokyo
- Assignee: Seiko Epson Corporation
- Current Assignee: Seiko Epson Corporation
- Current Assignee Address: JP Tokyo
- Agency: Oliff & Berridge, PLC
- Priority: JP2010-002693 20100108
- Main IPC: G02B5/30
- IPC: G02B5/30 ; G02B27/28

Abstract:
A polarizing element includes: a substrate; a plurality of reflection layers that is arranged in a band shape at a predetermined interval on the substrate; dielectric layers that are formed on the reflection layers; and inorganic micro-particle layers that are formed on the dielectric layers by inorganic micro-particles having shape anisotropy in which a length of a diameter of the micro-particles in an arrangement direction of the reflection layers is longer than a length of a diameter of the micro-particles in a direction orthogonal to the arrangement direction of the reflection layers and has convex portions toward a side of a first adjacent reflection layer and a side of a second adjacent reflection layer.
Public/Granted literature
- US20110170186A1 POLARIZING ELEMENT, METHOD OF MANUFACTURING POLARIZING ELEMENT, AND ELECTRONIC APPARATUS Public/Granted day:2011-07-14
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