Invention Grant
US08369125B2 Semiconductor integrated circuit device capable of securing gate performance and channel length 有权
能够确保门性能和通道长度的半导体集成电路器件

  • Patent Title: Semiconductor integrated circuit device capable of securing gate performance and channel length
  • Patent Title (中): 能够确保门性能和通道长度的半导体集成电路器件
  • Application No.: US13087838
    Application Date: 2011-04-15
  • Publication No.: US08369125B2
    Publication Date: 2013-02-05
  • Inventor: Myoung Jin Lee
  • Applicant: Myoung Jin Lee
  • Applicant Address: KR Gyeonggi-do
  • Assignee: SK Hynix Inc.
  • Current Assignee: SK Hynix Inc.
  • Current Assignee Address: KR Gyeonggi-do
  • Agency: William Park & Associates Ltd.
  • Priority: KR10-2010-0035280 20100416; KR10-2011-0034635 20110414
  • Main IPC: G11C5/06
  • IPC: G11C5/06
Semiconductor integrated circuit device capable of securing gate performance and channel length
Abstract:
A semiconductor integrated circuit device includes a semiconductor substrate; a plurality of word lines extending parallel to one another on the semiconductor substrate; a plurality of bit lines extending parallel to one another on the semiconductor substrate, arranged to cross with the word lines, and delimiting a plurality of crossing regions where the word lines intersect the bit lines and a plurality of unit memory cell regions with each cell region bounded by an adjacent pair of the word lines and an adjacent pair of the bit lines; and gate electrodes for the respective unit memory cell regions, each gate electrode electrically connected with any one of a pair of word lines which delimit a corresponding unit memory cell, and formed such that at least a portion of the gate electrode is bent toward a bit line direction.
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