Invention Grant
- Patent Title: Semiconductor integrated circuit device capable of securing gate performance and channel length
- Patent Title (中): 能够确保门性能和通道长度的半导体集成电路器件
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Application No.: US13087838Application Date: 2011-04-15
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Publication No.: US08369125B2Publication Date: 2013-02-05
- Inventor: Myoung Jin Lee
- Applicant: Myoung Jin Lee
- Applicant Address: KR Gyeonggi-do
- Assignee: SK Hynix Inc.
- Current Assignee: SK Hynix Inc.
- Current Assignee Address: KR Gyeonggi-do
- Agency: William Park & Associates Ltd.
- Priority: KR10-2010-0035280 20100416; KR10-2011-0034635 20110414
- Main IPC: G11C5/06
- IPC: G11C5/06

Abstract:
A semiconductor integrated circuit device includes a semiconductor substrate; a plurality of word lines extending parallel to one another on the semiconductor substrate; a plurality of bit lines extending parallel to one another on the semiconductor substrate, arranged to cross with the word lines, and delimiting a plurality of crossing regions where the word lines intersect the bit lines and a plurality of unit memory cell regions with each cell region bounded by an adjacent pair of the word lines and an adjacent pair of the bit lines; and gate electrodes for the respective unit memory cell regions, each gate electrode electrically connected with any one of a pair of word lines which delimit a corresponding unit memory cell, and formed such that at least a portion of the gate electrode is bent toward a bit line direction.
Public/Granted literature
- US20110255324A1 SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE CAPABLE OF SECURING GATE PERFORMANCE AND CHANNEL LENGTH Public/Granted day:2011-10-20
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