Invention Grant
US08369569B2 Method and apparatus for detecting non-uniform fracturing of a photomask shape
有权
用于检测光掩模形状的不均匀压裂的方法和装置
- Patent Title: Method and apparatus for detecting non-uniform fracturing of a photomask shape
- Patent Title (中): 用于检测光掩模形状的不均匀压裂的方法和装置
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Application No.: US12257983Application Date: 2008-10-24
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Publication No.: US08369569B2Publication Date: 2013-02-05
- Inventor: Chee Peng Yeap , John T. Nogatch
- Applicant: Chee Peng Yeap , John T. Nogatch
- Applicant Address: US CA Mountain View
- Assignee: Synopsys, Inc.
- Current Assignee: Synopsys, Inc.
- Current Assignee Address: US CA Mountain View
- Agency: Park, Vaughan, Fleming & Dowler LLP
- Agent Laxman Sahasrabuddhe
- Main IPC: G06K9/00
- IPC: G06K9/00

Abstract:
One embodiment of the present invention provides a system that detects an occurrence of a given shape which has been fractured into a configuration of primitive shapes which is different from a desired configuration. The system selects a fractured-shape instantiation of the given shape, to which other fractured-shape instantiations for the given shape are compared. As a part of the comparison process, the system generates a filtered mask-pattern-description which includes primitive shapes in the mask-pattern-description that match at least one primitive shape in the selected fractured-shape instantiation. Next, the system identifies a first set of shape occurrences from the filtered mask-pattern-description which match the given shape, and identifies a second set of shape occurrences from the mask-pattern-description which match the given shape. The system then generates a third set of shape occurrences by performing an exclusive-OR comparison between the first and second sets of shape occurrences.
Public/Granted literature
- US20090238467A1 METHOD AND APPARATUS FOR DETECTING NON-UNIFORM FRACTURING OF A PHOTOMASK SHAPE Public/Granted day:2009-09-24
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