Invention Grant
- Patent Title: Length measurement system
- Patent Title (中): 长度测量系统
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Application No.: US12190818Application Date: 2008-08-13
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Publication No.: US08369602B2Publication Date: 2013-02-05
- Inventor: Atsuko Yamaguchi , Jiro Yamamoto , Hiroki Kawada
- Applicant: Atsuko Yamaguchi , Jiro Yamamoto , Hiroki Kawada
- Applicant Address: JP Tokyo
- Assignee: Hitachi High-Technologies Corporation
- Current Assignee: Hitachi High-Technologies Corporation
- Current Assignee Address: JP Tokyo
- Agency: Mattingly & Malur, P.C.
- Priority: JP2007-212532 20070817
- Main IPC: G06K9/00
- IPC: G06K9/00

Abstract:
Disclosed herewith is a length measurement system, which obtains a value closer to its true one when figuring out the size and edge roughness of a pattern from a noise-included pattern image. Among plural band-like regions representing a portion around an edge in an image respectively, the system calculates the dependency of the edge point position on the image processing parameter at each of a narrow width band-like portion and a wide width band-like portion to calculate an image processing condition that calculates each measured value closer to its true value or estimates the true value itself.
Public/Granted literature
- US20090046896A1 LENGTH MEASUREMENT SYSTEM Public/Granted day:2009-02-19
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