Invention Grant
US08369604B2 Position detector, position detection method, exposure apparatus, and device manufacturing method
有权
位置检测器,位置检测方法,曝光装置和装置制造方法
- Patent Title: Position detector, position detection method, exposure apparatus, and device manufacturing method
- Patent Title (中): 位置检测器,位置检测方法,曝光装置和装置制造方法
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Application No.: US12243408Application Date: 2008-10-01
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Publication No.: US08369604B2Publication Date: 2013-02-05
- Inventor: Nozomu Hayashi
- Applicant: Nozomu Hayashi
- Applicant Address: JP Tokyo
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP Tokyo
- Agency: Fitzpatrick, Cella, Harper & Scinto
- Priority: JP2007-283791 20071031
- Main IPC: G06K9/00
- IPC: G06K9/00

Abstract:
A position detector, which detects the position of a mark formed on a substrate (W), comprises a creating unit (9), a search unit (13), and a correction unit (14). The creating unit (9) creates a template used for identifying a mark to be detected (WM) based on an image including the mark (WM). The search unit (13) searches an image by using the template created by the creating unit (9), and determines whether there is a pseudo pattern, other than the pattern of the mark (WM), whose degree of matching with the template is higher than a reference value. The correction unit (14) corrects the template based on the information of the pseudo pattern when it is determined that there is the pseudo pattern, and creates a corrected template whose degree of matching with the pseudo pattern is lower than the reference value.
Public/Granted literature
- US20090110264A1 POSITION DETECTOR, POSITION DETECTION METHOD, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD Public/Granted day:2009-04-30
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