Invention Grant
- Patent Title: Fabric structure
- Patent Title (中): 织物结构
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Application No.: US12948781Application Date: 2010-11-18
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Publication No.: US08371339B2Publication Date: 2013-02-12
- Inventor: Chen-Liang Li , Kuo-Hsiang Wang
- Applicant: Chen-Liang Li , Kuo-Hsiang Wang
- Applicant Address: TW New Taipei
- Assignee: Taiwan Textile Research Institute
- Current Assignee: Taiwan Textile Research Institute
- Current Assignee Address: TW New Taipei
- Agency: Jianq Chyun IP Office
- Priority: TW97149763A 20081219
- Main IPC: D03D13/00
- IPC: D03D13/00 ; D03D15/00 ; D03D1/00 ; D03D25/00

Abstract:
A fabric structure includes a first fabric layer, a second fabric layer, a plurality of conductive yarns, and a plurality of connecting yarns. A yarn coverage ratio of the first fabric layer ranges from about 90% to about 100%. A yarn coverage ratio of the second fabric layer ranges from about 90% to about 100%. The conductive yarns are distributed between the first fabric layer and the second fabric layer. The connecting yarns interlace the first fabric layer and the second fabric layer, so that the conductive yarns are sandwiched between the first fabric layer and the second fabric layer. The conductive yarns and the connecting yarns are not interlaced.
Public/Granted literature
- US20110061842A1 FABRIC STRUCTURE Public/Granted day:2011-03-17
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