A film-formation method is a method for depositing a liquid containing a film material to form a film in a prescribed film formation area enclosed by a partition wall on a substrate. The film-formation method includes forming the partition wall using at least in part a wettability-variable material in which wettability with respect to the liquid is variable, depositing the liquid in the film formation area, varying the wettability of the wettability-variable material in the partition wall in a state in which the liquid is disposed within the film formation area so that liquid affinity of the wettability-variable material becomes higher than liquid affinity of the wettability-variable material before the liquid is deposited in the film formation area, and forming the film by solidifying the film material in the liquid.