Invention Grant
- Patent Title: Photosensitive resin compositions and photosensitive dry films using the same
- Patent Title (中): 感光树脂组合物和使用其的光敏干膜
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Application No.: US12801451Application Date: 2010-06-09
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Publication No.: US08372577B2Publication Date: 2013-02-12
- Inventor: Yukihiko Tanaka , Shinkichi Asahi , Naoya Katsumata
- Applicant: Yukihiko Tanaka , Shinkichi Asahi , Naoya Katsumata
- Applicant Address: JP Kanagawa
- Assignee: Tokyo Ohka Kogyo Co., Ltd.
- Current Assignee: Tokyo Ohka Kogyo Co., Ltd.
- Current Assignee Address: JP Kanagawa
- Agency: Wenderoth, Lind & Ponack, L.L.P.
- Priority: JP2003-355032 20031015
- Main IPC: G03F7/031
- IPC: G03F7/031 ; G03F7/033 ; G03F7/11

Abstract:
It is disclosed a photosensitive resin composition comprising (a) a binder polymer based on a copolymer containing benzyl (meth)acrylate as a building block, (b) a photopolymerizable compound having at least one polymerizable ethylenically unsaturated group in the molecule and (c) a photopolymerization initiator based on a hexarylbisimidazole compound, with a light-initiated color former being optionally contained as component (d). The composition has long-term keeping quality, exhibits particularly high resistance to plating and dry etching, as well as assuring improvement in resolution and adhesion; the composition may be used to form a photosensitive dry film.
Public/Granted literature
- US20110065046A1 Photosensitive resin compositions and photosensitive dry films using the same Public/Granted day:2011-03-17
Information query
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