Invention Grant
US08372651B2 Method of monitoring a surfactant in a microelectronic process by absorbance
有权
通过吸光度监测微电子工艺中的表面活性剂的方法
- Patent Title: Method of monitoring a surfactant in a microelectronic process by absorbance
- Patent Title (中): 通过吸光度监测微电子工艺中的表面活性剂的方法
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Application No.: US11696797Application Date: 2007-04-05
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Publication No.: US08372651B2Publication Date: 2013-02-12
- Inventor: Amy M. Tseng , John E. Hoots , Brian V. Jenkins
- Applicant: Amy M. Tseng , John E. Hoots , Brian V. Jenkins
- Applicant Address: US IL Naperville
- Assignee: Nalco Company
- Current Assignee: Nalco Company
- Current Assignee Address: US IL Naperville
- Agency: Calfee, Halter & Griswold, LLP
- Main IPC: G01N21/75
- IPC: G01N21/75
Abstract:
A method of monitoring a surfactant in a microelectronic process is disclosed. Specifically, the monitoring of a surfactant occurs by studying the absorbance of a sample collected from a microelectronic process.
Public/Granted literature
- US20080245134A1 METHOD OF MONITORING A SURFACTANT IN A MICROELECTRONIC PROCESS BY ABSORBANCE Public/Granted day:2008-10-09
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