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US08372687B2 System, method and apparatus for forming multiple layers in a single process chamber 有权
用于在单个处理室中形成多个层的系统,方法和装置

  • Patent Title: System, method and apparatus for forming multiple layers in a single process chamber
  • Patent Title (中): 用于在单个处理室中形成多个层的系统,方法和装置
  • Application No.: US12932114
    Application Date: 2011-02-16
  • Publication No.: US08372687B2
    Publication Date: 2013-02-12
  • Inventor: Aiguo Feng
  • Applicant: Aiguo Feng
  • Applicant Address: US CA San Jose
  • Assignee: Ahbee1, LP
  • Current Assignee: Ahbee1, LP
  • Current Assignee Address: US CA San Jose
  • Main IPC: H01L21/06
  • IPC: H01L21/06 H01L21/00 H01L21/36 H01L29/08
System, method and apparatus for forming multiple layers in a single process chamber
Abstract:
A method for forming multiple layers in a single process chamber includes placing a substrate in the process chamber having multiple processing sources and iteratively forming a copper indium gallium selenium (CIGS) including forming multiple relatively thin CIGS layers including forming a copper indium gallium (CIG) layer on the substrate, the CIG layer having a thickness of between less than about 50 angstroms and about 200 angstroms, forming a selenium layer on the CIG layer, the selenium layer having a thickness of between less than about 50 angstroms and about 200 angstroms and heating the substrate, the CIG layer and the selenium layer. A processing chamber system is also disclosed.
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