Invention Grant
US08372687B2 System, method and apparatus for forming multiple layers in a single process chamber
有权
用于在单个处理室中形成多个层的系统,方法和装置
- Patent Title: System, method and apparatus for forming multiple layers in a single process chamber
- Patent Title (中): 用于在单个处理室中形成多个层的系统,方法和装置
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Application No.: US12932114Application Date: 2011-02-16
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Publication No.: US08372687B2Publication Date: 2013-02-12
- Inventor: Aiguo Feng
- Applicant: Aiguo Feng
- Applicant Address: US CA San Jose
- Assignee: Ahbee1, LP
- Current Assignee: Ahbee1, LP
- Current Assignee Address: US CA San Jose
- Main IPC: H01L21/06
- IPC: H01L21/06 ; H01L21/00 ; H01L21/36 ; H01L29/08

Abstract:
A method for forming multiple layers in a single process chamber includes placing a substrate in the process chamber having multiple processing sources and iteratively forming a copper indium gallium selenium (CIGS) including forming multiple relatively thin CIGS layers including forming a copper indium gallium (CIG) layer on the substrate, the CIG layer having a thickness of between less than about 50 angstroms and about 200 angstroms, forming a selenium layer on the CIG layer, the selenium layer having a thickness of between less than about 50 angstroms and about 200 angstroms and heating the substrate, the CIG layer and the selenium layer. A processing chamber system is also disclosed.
Public/Granted literature
- US20120208314A1 System, method and apparatus for thin film manufacturing Public/Granted day:2012-08-16
Information query
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