Fabrication of CMOS transistors having differentially stressed spacers

Invention Grant

US08372705B2 Fabrication of CMOS transistors having differentially stressed spacers 有权

Title translation: 具有差分应力间隔物的CMOS晶体管的制造

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Patent Title: Fabrication of CMOS transistors having differentially stressed spacers
Patent Title (中): 具有差分应力间隔物的CMOS晶体管的制造
Application No.: US13013801

Application Date: 2011-01-25
Publication No.: US08372705B2

Publication Date: 2013-02-12
Inventor: Lahir Shaik Adam , Sanjay C Mehta , Balasubramanian S Haran , Bruce B. Doris
Applicant: Lahir Shaik Adam , Sanjay C Mehta , Balasubramanian S Haran , Bruce B. Doris
Applicant Address: US NY Armonk
Assignee: International Business Machines Corporation
Current Assignee: International Business Machines Corporation
Current Assignee Address: US NY Armonk
Agent Louis J. Percello; Robert M. Trepp
Main IPC: H01L21/8238
IPC: H01L21/8238

Fabrication of CMOS transistors having differentially stressed spacers

Abstract:

CMOS transistors are formed incorporating a gate electrode having tensely stressed spacers on the gate sidewalls of an n channel field effect transistor and having compressively stressed spacers on the gate sidewalls of a p channel field effect transistor to provide differentially stressed channels in respective transistors to increase carrier mobility in the respective channels.

Abstract(Chinese):

形成CMOS晶体管，其结合有在n沟道场效应晶体管的栅极侧壁上具有紧张应力间隔物的栅极，并且在ap沟道场效应晶体管的栅极侧壁上具有压缩应力间隔物，以在相应晶体管中提供差分应力通道以增加载流子迁移率在各自的频道。

Public/Granted literature

US20120187482A1 FABRICATION OF CMOS TRANSISTORS HAVING DIFFERENTIALLY STRESSED SPACERS Public/Granted day:2012-07-26

Information query

Espacenet

IPC分类:

H	电学
H01	基本电气元件
H01L	半导体器件；其他类目中不包括的电固体器件（使用半导体器件的测量入G01；一般电阻器入H01C；磁体、电感器、变压器入H01F；一般电容器入H01G；电解型器件入H01G9/00；电池组、蓄电池入H01M；波导管、谐振器或波导型线路入H01P；线路连接器、汇流器入H01R；受激发射器件入H01S；机电谐振器入H03H；扬声器、送话器、留声机拾音器或类似的声机电传感器入H04R；一般电光源入H05B；印刷电路、混合电路、电设备的外壳或结构零部件、电气元件的组件的制造入H05K；在具有特殊应用的电路中使用的半导体器件见应用相关的小类）
H01L21/00	专门适用于制造或处理半导体或固体器件或其部件的方法或设备
H01L21/70	.由在一共用基片内或其上形成的多个固态组件或集成电路组成的器件或其部件的制造或处理；集成电路器件或其特殊部件的制造（由预制电组件组成的组装件的制造入H05K3/00，H05K13/00）
H01L21/77	..在公共衬底中或上面形成的由许多固态元件或集成电路组成的器件的制造或处理（电可编程只读存储器或其多步骤的制造方法入H01L27/115）
H01L21/78	...把衬底连续地分成多个独立的器件（改变表面物理特性或者半导体形状的切割入H01L21/304）
H01L21/82	....制造器件，例如每一个由许多元件组成的集成电路
H01L21/822	.....衬底是采用硅工艺的半导体的（H01L21/8258优先）
H01L21/8232	......场效应工艺
H01L21/8234	.......MIS工艺
H01L21/8238	........互补场效应晶体管，例如CMOS