Invention Grant
- Patent Title: Vertical channel transistors and methods for fabricating vertical channel transistors
- Patent Title (中): 垂直沟道晶体管和制造垂直沟道晶体管的方法
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Application No.: US13035145Application Date: 2011-02-25
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Publication No.: US08372715B2Publication Date: 2013-02-12
- Inventor: Hyun-Woo Chung , Hui-Jung Kim , Yongchul Oh , Hyun-Gi Kim , Kang-Uk Kim
- Applicant: Hyun-Woo Chung , Hui-Jung Kim , Yongchul Oh , Hyun-Gi Kim , Kang-Uk Kim
- Applicant Address: KR Gyeonggi-do
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Gyeonggi-do
- Agency: Harness, Dickey & Pierce, P.L.C.
- Priority: KR10-2010-0021902 20100311
- Main IPC: H01L21/336
- IPC: H01L21/336

Abstract:
Provided are a vertical channel transistor and a method for fabricating a vertical channel transistor. The method includes forming an active layer on a substrate, forming a plurality of vertical channels on the active layer, forming a plurality of isolated gate electrodes to surround sidewalls of the plurality of vertical channels, forming a buried bitline to extend along the active layer between the plurality of vertical channels, forming a plug-in between the plurality of vertical channels to connect the plurality of isolated gate electrodes and forming a wordline on a location where the plug-in and the plurality of isolated gate electrodes are connected.
Public/Granted literature
- US20110223731A1 Vertical Channel Transistors And Methods For Fabricating Vertical Channel Transistors Public/Granted day:2011-09-15
Information query
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