Invention Grant
- Patent Title: Dry cleaning of silicon surface for solar cell applications
- Patent Title (中): 太阳能电池应用的硅表面干洗
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Application No.: US12825103Application Date: 2010-06-28
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Publication No.: US08372753B2Publication Date: 2013-02-12
- Inventor: Virendra V S Rana , Michael P. Stewart
- Applicant: Virendra V S Rana , Michael P. Stewart
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Patterson & Sheridan, LLP
- Main IPC: H01L21/31
- IPC: H01L21/31
Abstract:
A method and apparatus for cleaning layers of solar cell substrates is disclosed. The substrate is exposed to a reactive gas that may comprise neutral radicals comprising nitrogen and fluorine, or that may comprise anhydrous HF and water, alcohol, or a mixture of water and alcohol. The reactive gas may further comprise a carrier gas. The reactive gas etches the solar cell substrate surface, removing oxygen and other impurities. When exposed to the neutral radicals, the substrate grows a thin film containing ammonium hexafluorosilicate, which is subsequently removed by heat treatment.
Public/Granted literature
- US20100261302A1 DRY CLEANING OF SILICON SURFACE FOR SOLAR CELL APPLICATIONS Public/Granted day:2010-10-14
Information query
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