Invention Grant
US08372938B2 Mask material composition, method of forming impurity diffusion layer, and solar battery
失效
掩模材料组成，形成杂质扩散层的方法和太阳能电池
- Patent Title: Mask material composition, method of forming impurity diffusion layer, and solar battery
- Patent Title (中): 掩模材料组成，形成杂质扩散层的方法和太阳能电池
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Application No.: US12939875Application Date: 2010-11-04
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Publication No.: US08372938B2Publication Date: 2013-02-12
- Inventor: Motoki Takahashi , Toshiro Morita , Takaaki Hirai
- Applicant: Motoki Takahashi , Toshiro Morita , Takaaki Hirai
- Applicant Address: JP Kawasaki-shi
- Assignee: Tokyo Ohka Kogyo Co., Ltd.
- Current Assignee: Tokyo Ohka Kogyo Co., Ltd.
- Current Assignee Address: JP Kawasaki-shi
- Agency: Knobbe Martens Olson & Bear LLP
- Priority: JP2009-255387 20091106; JP2010-237107 20101022
- Main IPC: C08G77/00
- IPC: C08G77/00
Abstract:
A mask material composition that is used for diffusion barrier of an impurity diffusing component into a semiconductor substrate includes a siloxane resin (A1) containing a constituent unit represented by the following formula (a1): wherein R1 is a single bond or C1-C5 alkylene group; and R2 is a C6-C20 aryl group.
Public/Granted literature
- US20110108095A1 MASK MATERIAL COMPOSITION, METHOD OF FORMING IMPURITY DIFFUSION LAYER, AND SOLAR BATTERY Public/Granted day:2011-05-12
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