Invention Grant
- Patent Title: Thin film transistor
- Patent Title (中): 薄膜晶体管
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Application No.: US12859278Application Date: 2010-08-19
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Publication No.: US08373168B2Publication Date: 2013-02-12
- Inventor: Jing-Yi Yan , Liang-Hsiang Chen
- Applicant: Jing-Yi Yan , Liang-Hsiang Chen
- Applicant Address: TW Hsinchu
- Assignee: Industrial Technology Research Institute
- Current Assignee: Industrial Technology Research Institute
- Current Assignee Address: TW Hsinchu
- Agency: Jianq Chyun IP Office
- Priority: TW97145335A 20081124
- Main IPC: H01L29/04
- IPC: H01L29/04

Abstract:
A thin film transistor is provided. The thin film transistor includes a gate, at least an inorganic material layer, at least one dielectric layer, a source, a drain, and an active layer. The active layer is located on the substrate. The source and the drain cover a part of the active layer and a part of the substrate. A channel region exists between the source and the drain. The inorganic material layer is filled into the channel region. The dielectric layer at least including an organic material covers the inorganic material, the source and the drain. The gate is disposed on the dielectric layer.
Public/Granted literature
- US20100308406A1 THIN FILM TRANSISTOR Public/Granted day:2010-12-09
Information query
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