Invention Grant
- Patent Title: Nanocluster charge storage device
- Patent Title (中): 纳米簇电荷存储装置
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Application No.: US11964309Application Date: 2007-12-26
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Publication No.: US08373221B2Publication Date: 2013-02-12
- Inventor: Robert F. Steimle , Ramachandran Muralidhar , Bruce E. White
- Applicant: Robert F. Steimle , Ramachandran Muralidhar , Bruce E. White
- Applicant Address: US TX Austin
- Assignee: Freescale Semiconductor, Inc.
- Current Assignee: Freescale Semiconductor, Inc.
- Current Assignee Address: US TX Austin
- Main IPC: H01L29/792
- IPC: H01L29/792

Abstract:
An integrated circuit and method of forming an integrated circuit having a memory portion minimizes an amount of oxidation of nanocluster storage elements in the memory portion. A first region of the integrated circuit has non-memory devices, each having a control electrode or gate formed of a single conductive layer of material. A second region of the integrated circuit has a plurality of memory cells, each having a control electrode of at least two conductive layers of material that are positioned one overlying another. The at least two conductive layers are at substantially a same electrical potential when operational and form a single gate electrode. In one form each memory cell gate has two polysilicon layers overlying a nanocluster storage layer.
Public/Granted literature
- US20080105945A1 METHOD OF FORMING A NANOCLUSTER CHARGE STORAGE DEVICE Public/Granted day:2008-05-08
Information query
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