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US08373226B2 Semiconductor device including a Trench-Gate Fin-FET 失效
包括沟槽栅极Fin-FET的半导体器件

Semiconductor device including a Trench-Gate Fin-FET
Abstract:
In Trench-Gate Fin-FET, in order that the advantage which is exerted in Fin-FET can be sufficiently taken even if a transistor becomes finer and, at the same time, decreasing of on-current can be suppressed by saving a sufficiently large contact area in the active region, a fin width 162 of a channel region becomes smaller than a width 161 of an active region.
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