Invention Grant
- Patent Title: Antireflective hard mask compositions
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Application No.: US12582673Application Date: 2009-10-20
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Publication No.: US08373241B2Publication Date: 2013-02-12
- Inventor: Dana A. Gronbeck , Amy M. Kwok , Chi Q. Truong , Michael K. Gallagher , Anthony Zampini
- Applicant: Dana A. Gronbeck , Amy M. Kwok , Chi Q. Truong , Michael K. Gallagher , Anthony Zampini
- Applicant Address: US MA Marlborough
- Assignee: Rohm and Haas Electronic Materials LLC
- Current Assignee: Rohm and Haas Electronic Materials LLC
- Current Assignee Address: US MA Marlborough
- Agency: Edwards Wildman Palmer LLP
- Agent Peter F. Corless; Darryl P. Frickey
- Main IPC: H01L21/76
- IPC: H01L21/76
Abstract:
The invention includes new organic-containing compositions that can function as an antireflective layer for an overcoated photoresist. Compositions of the invention also can serve effectively as a hard mask layer by exhibiting a sufficient plasma etch selectivity from an undercoated layer. Preferred compositions of the invention have a high Si content and comprise a blend of distinct resins.
Public/Granted literature
- US20100297539A1 ANTIREFLECTIVE HARD MASK COMPOSITIONS Public/Granted day:2010-11-25
Information query
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