Invention Grant
US08373245B2 2DEG Schottky diode formed in nitride material with a composite Schottky/ohmic electrode structure and method of making the same
有权
2DEG肖特基二极管以氮化物形成复合肖特基/欧姆电极结构及其制造方法
- Patent Title: 2DEG Schottky diode formed in nitride material with a composite Schottky/ohmic electrode structure and method of making the same
- Patent Title (中): 2DEG肖特基二极管以氮化物形成复合肖特基/欧姆电极结构及其制造方法
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Application No.: US12654940Application Date: 2010-01-08
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Publication No.: US08373245B2Publication Date: 2013-02-12
- Inventor: Woo Chul Jeon , Jung Hee Lee , Young Hwan Park , Ki Yeol Park
- Applicant: Woo Chul Jeon , Jung Hee Lee , Young Hwan Park , Ki Yeol Park
- Applicant Address: KR Suwon
- Assignee: Samsung Electro-Mechanics Co., Ltd.
- Current Assignee: Samsung Electro-Mechanics Co., Ltd.
- Current Assignee Address: KR Suwon
- Priority: KR10-2009-0084597 20090908
- Main IPC: H01L29/47
- IPC: H01L29/47

Abstract:
Disclosed is a semiconductor device including: a base substrate; a semiconductor layer disposed on the base substrate; an ohmic electrode part which has ohmic electrode lines disposed in a first direction, on the semiconductor layer; and a Schottky electrode part which is disposed to be spaced apart from the ohmic electrode lines on the semiconductor layer and includes Schottky electrode lines disposed in the first direction, wherein the Schottky electrode lines and the ohmic electrode lines are alternately disposed in parallel, and the ohmic electrode part further includes first ohmic electrodes covered by the Schottky electrode lines on the semiconductor layer.
Public/Granted literature
- US20110057234A1 Semiconductor device and method for manufacturing of the same Public/Granted day:2011-03-10
Information query
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