Invention Grant
- Patent Title: Semiconductor device
- Patent Title (中): 半导体器件
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Application No.: US12770050Application Date: 2010-04-29
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Publication No.: US08373256B2Publication Date: 2013-02-12
- Inventor: Kishou Kaneko , Naoya Inoue , Yoshihiro Hayashi
- Applicant: Kishou Kaneko , Naoya Inoue , Yoshihiro Hayashi
- Applicant Address: JP Kanagawa
- Assignee: Renesas Electronics Corporation
- Current Assignee: Renesas Electronics Corporation
- Current Assignee Address: JP Kanagawa
- Agency: Young & Thompson
- Priority: JP2009-110603 20090430; JP2010-034296 20100219
- Main IPC: H01L23/552
- IPC: H01L23/552

Abstract:
A semiconductor device includes: a semiconductor substrate; a semiconductor element formed on a principal surface of the semiconductor substrate and having a multiple-layered interconnect layer; and a heterostructure magnetic shield covering the semiconductor element. The heterostructure magnetic shield includes a first magnetic shield layered structure and a second magnetic shield layered structure that covers the first magnetic shield layered structure. Each of a first and a second magnetic shield layered structures includes a magnetic shielding film composed of a magnetic substance and covering the semiconductor element and a buffer film disposed between the semiconductor element and the magnetic shield films and preventing a diffusion of the magnetic substance.
Public/Granted literature
- US20100276791A1 SEMICONDUCTOR DEVICE Public/Granted day:2010-11-04
Information query
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