Invention Grant
- Patent Title: Lithographic apparatus and lorentz actuator
- Patent Title (中): 光刻设备和洛伦兹致动器
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Application No.: US12574553Application Date: 2009-10-06
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Publication No.: US08373848B2Publication Date: 2013-02-12
- Inventor: Fidelus Adrianus Boon , Hendrikus Pascal Gerardus Johannes Van Agtmaal
- Applicant: Fidelus Adrianus Boon , Hendrikus Pascal Gerardus Johannes Van Agtmaal
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: G03B27/58
- IPC: G03B27/58

Abstract:
A lithographic apparatus includes an actuator for producing a force in a first direction between a first and a second part including a first magnet assembly and a second magnet assembly each attached opposite to each other to the first part of the apparatus, the first magnet assembly including a first main magnet system and a first subsidiary magnet system, and the second magnet assembly including a second main magnet system and a second subsidiary magnet system, the first and second main magnet system defining a space between them in a second direction perpendicular to the first direction. The actuator includes a coil attached to the second part. The distance between at least a part of the first subsidiary magnet system and at least a part of the second subsidiary magnet system is smaller than the minimum distance between the first main magnet system and the second main magnet system.
Public/Granted literature
- US20100085552A1 LITHOGRAPHIC APPARATUS AND LORENTZ ACTUATOR Public/Granted day:2010-04-08
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