Invention Grant
- Patent Title: Lithographic apparatus and control system
- Patent Title (中): 平版印刷设备和控制系统
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Application No.: US12580328Application Date: 2009-10-16
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Publication No.: US08373849B2Publication Date: 2013-02-12
- Inventor: Marcel François Heertjes
- Applicant: Marcel François Heertjes
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: G03B27/58
- IPC: G03B27/58 ; G03B27/62 ; G03B27/42 ; G03B27/32

Abstract:
A control system to control a position quantity of a movable object in dependency of signals provided by a sensor representing an actual position quantity of the moveable object, the control system being configured to provide a drive signal to an actuator which is able to apply forces to the moveable object, the control system including a set-point generator to provide a reference signal; a subtractor to provide an error signal, the error signal being the difference between the reference signal and the signals provided by the sensor; a control unit to provide a drive signal to the actuator in dependency of the error signal, wherein the control unit comprises a nonlinear controller to improve a low-frequency disturbance suppression, and wherein the control unit further includes a compensator to at least partially compensate the deterioration of the high-frequency behavior caused by the nonlinear controller.
Public/Granted literature
- US20100123890A1 LITHOGRAPHIC APPARATUS AND CONTROL SYSTEM Public/Granted day:2010-05-20
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