Invention Grant
- Patent Title: Wavefront aberration measuring apparatus, wavefront aberration measuring method, exposure apparatus, and device manufacturing method
- Patent Title (中): 波前像差测量装置,波前像差测量方法,曝光装置和装置制造方法
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Application No.: US12399612Application Date: 2009-03-06
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Publication No.: US08373866B2Publication Date: 2013-02-12
- Inventor: Kazuki Yamamoto
- Applicant: Kazuki Yamamoto
- Applicant Address: JP Tokyo
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP Tokyo
- Agency: Canon USA, Inc., IP Division
- Priority: JP2008-058219 20080307
- Main IPC: G01B11/02
- IPC: G01B11/02

Abstract:
An apparatus measuring wavefront aberration of an optical system includes a first mask in an object plane and having plural openings, an illumination optical system illuminating the openings of the first mask by using light from a light source, a second mask in an image plane and having an opening allowing passage of light containing aberration of the optical system and a pinhole/slit. The apparatus takes an image of interference fringe generated by light having passed through the optical system and the pinhole/slit and the light having passed through the optical system and the opening of the second mask, calculates an evaluation value to evaluate a state of the interference fringe by using image data of the image, determines, based on the evaluation value, whether the wavefront aberration of the inspected optical system is to be calculated, and calculates the wavefront aberration of the optical system from the image data.
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