An aspect of the present invention is a method for laying out a power wiring of a semiconductor device. The method includes: modeling the power wiring as an analysis model including a plurality of nodes and a plurality of element resistors provided between the plurality of nodes neighboring each other; obtaining voltage values of the plurality of nodes by a circuit simulation; searching a path of a current flowing into a node of the plurality of nodes when an IR drop violation exists in the voltage values, the node having a maximum value of the IR drop violation; selecting a bottleneck element resistor from among the plurality of element resistors included in the path; and changing a resistance value of the bottleneck element resistor.