Invention Grant
- Patent Title: Method for fabricating porous silica preform
- Patent Title (中): 多孔二氧化硅预制件的制造方法
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Application No.: US12630440Application Date: 2009-12-03
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Publication No.: US08375749B2Publication Date: 2013-02-19
- Inventor: Kentaro Ichii , Takakazu Gotoh , Naritoshi Yamada , Koichi Harada
- Applicant: Kentaro Ichii , Takakazu Gotoh , Naritoshi Yamada , Koichi Harada
- Applicant Address: JP Tokyo
- Assignee: Fujikura Ltd.
- Current Assignee: Fujikura Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JP2003-381074 20031111; JP2003-391025 20031120
- Main IPC: C03B37/018
- IPC: C03B37/018

Abstract:
A method for fabricating a porous silica preform includes the steps of supplying fuel gas for generating an oxyhydrogen flame to a glass synthesizing burner; supplying Gas A containing silicon and Gas B containing fluorine to the burner; synthesizing glass particles; and depositing the glass particles around a starting rod, in which when glass particles are deposited directly on the starting rod, a supply of Gas A and a supply of Gas B supplied to the burner are adjusted so that a ratio of the number of fluorine atoms to the number of silicon atoms in the gas supplied to the burner satisfies the following Formula (1): {(number of F atoms)/(number of Si atoms)}≦0.1 (1).
Public/Granted literature
- US20100077800A1 METHOD FOR FABRICATING POROUS SILICAPREFORM AND POROUS SILICA PREFORM Public/Granted day:2010-04-01
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