Invention Grant
- Patent Title: Template cleaning method, system, and apparatus
- Patent Title (中): 模板清洗方法，系统和装置
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Application No.: US12560210Application Date: 2009-09-15
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Publication No.: US08375964B2Publication Date: 2013-02-19
- Inventor: Hiroshi Tomita , Hisashi Okuchi , Minako Inukai
- Applicant: Hiroshi Tomita , Hisashi Okuchi , Minako Inukai
- Applicant Address: JP Tokyo
- Assignee: Kabushiki Kaisha Toshiba
- Current Assignee: Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Tokyo
- Agency: Finnegan, Henderson, Farabow, Garrett & Dunner, L.L.P.
- Priority: JP2008-307215 20081202
- Main IPC: B08B3/02
- IPC: B08B3/02
Abstract:
A template cleaning method for cleaning a template for nanoimprint, according to an embodiment of the present invention includes placing a wafer on a stage provided in a chamber, cleaning the wafer placed on the stage, inspecting the wafer for particles after the cleaning of the wafer, placing the template on the stage after the inspection of the wafer, and cleaning the template placed on the stage.
Public/Granted literature
- US20100132742A1 TEMPLATE CLEANING METHOD, SYSTEM, AND APPARATUS Public/Granted day:2010-06-03
Information query
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