Invention Grant
- Patent Title: Microfluidic circuit
- Patent Title (中): 微流控电路
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Application No.: US11748140Application Date: 2007-05-14
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Publication No.: US08377389B2Publication Date: 2013-02-19
- Inventor: Shun Momose
- Applicant: Shun Momose
- Applicant Address: JP Kyoto
- Assignee: Rohm Co., Ltd.
- Current Assignee: Rohm Co., Ltd.
- Current Assignee Address: JP Kyoto
- Agency: Fish & Richardson P.C.
- Priority: JP2006-136783 20060516
- Main IPC: B01L3/00
- IPC: B01L3/00 ; G01N21/00

Abstract:
A fabrication method of a microfluidic circuit is provided, dispensable of mask registration, absent of deviation in mask positioning, and inexpensive in fabrication cost. The fabrication method of a microfluidic circuit has a light transmissive substrate stacked on a light absorptive substrate, and the light transmissive substrate welded with the light absorptive substrate for bonding by directing light through the light transmissive substrate. The microfluidic circuit includes a microchannel at the bottom face of the light transmissive substrate and/or at the top face of the light absorptive substrate. The method includes the step of forming, at the light transmissive substrate, a light attenuation region attenuating transmittance of light towards the microchannel when light is directed through the light transmissive substrate.
Public/Granted literature
- US20070277927A1 FABRICATION METHOD OF MICROFLUIDIC CIRCUIT, AND MICROFLUIDIC CIRCUIT FABRICATED BY METHOD THEREOF Public/Granted day:2007-12-06
Information query
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